Ion implantation and method of ion implantation

• Main Authors: RONALD F HORNER, ROBERT MITCHELL, JOHN GORDON, KEITH RELLEEN, THEODORE H SMICK
• Format: Patent
• Language: English
• Published: 19.05.2004
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

An ion implanter incorporates an r.f. accelerator assembly 10 to provide ions for implant at high energies. The accelerator assembly includes electrodes (Fig 2)mounted in the vacuum chamber so as to be movable between an operational positon (Fig.2A)for generating and accelerating electric field and a non operational position (Fig. 28)within the vacuum chamber displaced clear of the beam path. An Actuator moves the electrode between the operational and non operation positions. For energy implanting, the electrodes are in the operational position (Fig. 2A)and for low energy implants the actuator moves the electrodes to the non operational position (Fig. 2A) clear of the beam path.