Ion implantation and method of ion implantation

An ion implanter incorporates an r.f. accelerator assembly 10 to provide ions for implant at high energies. The accelerator assembly includes electrodes (Fig 2)mounted in the vacuum chamber so as to be movable between an operational positon (Fig.2A)for generating and accelerating electric field and...

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Bibliographic Details
Main Authors RONALD F HORNER, ROBERT MITCHELL, JOHN GORDON, KEITH RELLEEN, THEODORE H SMICK
Format Patent
LanguageEnglish
Published 19.05.2004
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:An ion implanter incorporates an r.f. accelerator assembly 10 to provide ions for implant at high energies. The accelerator assembly includes electrodes (Fig 2)mounted in the vacuum chamber so as to be movable between an operational positon (Fig.2A)for generating and accelerating electric field and a non operational position (Fig. 28)within the vacuum chamber displaced clear of the beam path. An Actuator moves the electrode between the operational and non operation positions. For energy implanting, the electrodes are in the operational position (Fig. 2A)and for low energy implants the actuator moves the electrodes to the non operational position (Fig. 2A) clear of the beam path.
Bibliography:Application Number: GB20020026261