Substrate transfer device

The present invention provides a vacuum stage device that moves a substrate to be processed in a vacuum environment. In a substrate transfer device in accordance with the present invention, a wafer mounted to a wafer platen is moved in a vacuum processing chamber. This substrate transfer device incl...

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Bibliographic Details
Main Authors YOSHIYUKI TOMITA, KAZUTOSHI SAKAKI, HIDEHIKO MORI
Format Patent
LanguageEnglish
Published 23.11.2005
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
BLASTING
CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILSOF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
CONVEYING
DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FLUID-PRESSURE ACTUATORS
FLUID-PRESSURE ACTUATORS, e.g. SERVO-MOTORS
HANDLING THIN OR FILAMENTARY MATERIAL
HEATING
HYDRAULICS OR PNEUMATICS IN GENERAL
INSTRUMENT DETAILS
LIGHTING
MECHANICAL ENGINEERING
PACKING
PERFORMING OPERATIONS
PHYSICS
PNEUMATIC TUBE CONVEYORS
SEMICONDUCTOR DEVICES
SHOP CONVEYOR SYSTEMS
STORING
SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL
TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING
TRANSPORTING
WEAPONS
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Summary:The present invention provides a vacuum stage device that moves a substrate to be processed in a vacuum environment. In a substrate transfer device in accordance with the present invention, a wafer mounted to a wafer platen is moved in a vacuum processing chamber. This substrate transfer device includes a first driving mechanism for moving the wafer platen in a Y 1 direction, and a second driving mechanism that is provided in the vacuum processing chamber and linearly reciprocates the wafer platen in X 1 and X 2 directions at a high speed.
Bibliography:Application Number: GB20020020093