Method and apparatus for insulating a high power RF electrode through which plasma discharge gases are injected into a processing chamber
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
31.12.2003
|
Edition | 7 |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Bibliography: | Application Number: GB20000030075 |
---|