Negative type photosensitive electrodeposition coating resin composition

• Main Authors: TAKUROO KATOO, ZIN AMANOKURA, KATSUSHIGE TSUKADA, TOSHIYA TAKAHASHI, YOSHIHISA NAGASHIMA, HIDEAKI UEHARA, SHIGEO TACHIKI, YUUZI YAMAZAKI, TOSHIHIKO SHIOTANI
• Format: Patent
• Language: English
• Published: 06.10.1993
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; APPARATUS THEREFOR; BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROFORMING; ELECTROGRAPHY; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; FILLING PASTES; HOLOGRAPHY; INKS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; PRINTED CIRCUITS; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

A resin composition comprising (a) a neutralised polymer of acrylic acid and/or methacrylic acid, (b) a non-water soluble monomer, (c) a non-water soluble photoinitiator, and (d) a benzotriazole derivative having a salt of carboxyl group, can provide a stable electrodeposition bath, which produces an electrodeposited film with uniform thickness and excellent surface appearance without producing developing residue. Compound (d) is of formula (I) or (II> wherein R is hydrogen, halogen, hydroxyl, alkyl, or alkoxy, R is hydrogen, hydroxyl, alkyl, phenyl or a group of the formula: -Z-R , in which Z is alkylene, cycloalkylene or alkylene ether and R is hydroxyl, alkoxy, a carboxylate salt or dialkylamino; Y is a carboxylate salt and n is an integer of 1 to 3 and when R contains a carboxylate salt group, n can also be zero, wherein R , R , Y and n are defined above.>