A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same

• Main Authors: TAKESHI OGURI, KATSUYA NAKANO, YUTAKA USUBUCHI
• Format: Patent
• Language: English
• Published: 20.03.1991
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

A sulfonic acid group-containing polyurethane is produced from a sulfonic acid group-containing polyamide diol and/or a sulfonic acid group containing polyester diol, a dihydroxyhydrocarbon having a specific molecular weight and a diisocyanato. This polyurethane has not only high hydrophilicity but also excellent mechanical strength, excellent heat resistance, low permanent tensile set and low hardness, which are required for the base polymer for a photosensitive resin composition to be used for producing a flexographic printing plate. After the photosensitive resin composition has been exposed to actinic rays through an image-bearing transparency, the development of the exposed composition can be performed with water or an aqueous alkali solution. The dihydroxyhydrocarbon is suitably an OH-terminated polybutadiene. The photosensitive resin composition comprises the polyurethane, an ethylenically unsaturated compound and a photopolymerization initiator.