APPARATUS FOR FORMING A THIN FILM

An apparatus for forming a thin film having a vacuum container evacuated to high vacuum and receiving a gas for vapor deposition, a source of evaporation for evaporating a substance, a counter electrode holding a substrate to be vapor-deposited, a grid disposed between the source and the electrode f...

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Bibliographic Details
Main Authors MIKIO KINOSHITA, WASABURO OHTA, TORU MIYABORI
Format Patent
LanguageEnglish
Published 21.12.1988
Edition4
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:An apparatus for forming a thin film having a vacuum container evacuated to high vacuum and receiving a gas for vapor deposition, a source of evaporation for evaporating a substance, a counter electrode holding a substrate to be vapor-deposited, a grid disposed between the source and the electrode for accelerating the evaporated substance, and an electronic gun for emitting thermions, which are hit on the evaporated substances to ionize them.
Bibliography:Application Number: GB19880013735