VAPOUR DEPOSITION OF FILMS

There is provided a method of producing inorganic thin films by metal inorganic chemical vapour deposition. The method comprises forming a vapour stream (10) comprising a vapour mixture of an organometallic compound and a heterocyclic organic compound incorporating a group V or group VI element, and...

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Bibliographic Details
Main Authors RICHARD JOHN MOSTYN GRIFFITHS, BRIAN COCKAYNE, PETER JOHN WRIGHT
Format Patent
LanguageEnglish
Published 31.05.1984
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F
COMPOUNDS THEREOF
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:There is provided a method of producing inorganic thin films by metal inorganic chemical vapour deposition. The method comprises forming a vapour stream (10) comprising a vapour mixture of an organometallic compound and a heterocyclic organic compound incorporating a group V or group VI element, and thermally decomposing the mixture on a heated substrate (13) to form an inorganic layer. The heterocyclic compound may be an aliphatic or aromatic ring compound. The mixture may include vapours appropriate for deposition of ternary or higher order compounds, and/or for introducing dopants.
Bibliography:Application Number: GB19830027758