INSPECTING PHOTOMASKS FOR DUST

Disclosed is an apparatus for inspecting negatives which is provided with a laser beam generating source, a scanner for scanning the laser beam, a holding device for holding a negative having a pattern formed in a reflective area on a first surface of a transparent plate and transferring the negativ...

Full description

Saved in:
Bibliographic Details
Main Author HIDEKI INA
Format Patent
LanguageEnglish
Published 07.01.1987
Edition4
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CALCULATING
CINEMATOGRAPHY
COMPUTING
COUNTING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASURING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
Online AccessGet full text

Cover

More Information
Summary:Disclosed is an apparatus for inspecting negatives which is provided with a laser beam generating source, a scanner for scanning the laser beam, a holding device for holding a negative having a pattern formed in a reflective area on a first surface of a transparent plate and transferring the negative in a direction perpendicular to the scanning direction of the laser beam, a first converging lens for converging the laser beam on said first surface, a second converging lens for converging on a first photocell the beam transmitted through the negative, a third converging lens for converging on a second photocell the beam reflected by the first surface of the negative, and a comparator for comparing a first signal stream put out from the first photocell and a second signal stream put out from the second photocell and detecting an undesirable adhering matter.
Bibliography:Application Number: GB19830007940