Elément résistif et procédé et appareil pour le fabriquer

A resistive element is provided which is used on a cathode conductor side of a field emission type fluorescent display device and made of a hydrogenated amorphous silicon film. Nitride is added during deposition of the hydrogenated amorphous silicon film containing an impurity for controlling resist...

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Bibliographic Details
Main Authors SHIGEO ITOH, TAKAHIRO NIIYAMA, WATANABE TERUO
Format Patent
LanguageFrench
Published 10.07.1998
Edition6
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
RESISTORS
SEMICONDUCTOR DEVICES
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Summary:A resistive element is provided which is used on a cathode conductor side of a field emission type fluorescent display device and made of a hydrogenated amorphous silicon film. Nitride is added during deposition of the hydrogenated amorphous silicon film containing an impurity for controlling resistivity of the film. A method for producing the resistive element and an apparatus therefor are also disclosed.
Bibliography:Application Number: FR19950003368