Elément résistif et procédé et appareil pour le fabriquer

A resistive element is provided which is used on a cathode conductor side of a field emission type fluorescent display device and made of a hydrogenated amorphous silicon film. Nitride is added during deposition of the hydrogenated amorphous silicon film containing an impurity for controlling resist...

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Bibliographic Details
Main Authors SHIGEO ITOH, TAKAHIRO NIIYAMA, WATANABE TERUO
Format Patent
LanguageFrench
Published 10.07.1998
Edition6
Subjects
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Summary:A resistive element is provided which is used on a cathode conductor side of a field emission type fluorescent display device and made of a hydrogenated amorphous silicon film. Nitride is added during deposition of the hydrogenated amorphous silicon film containing an impurity for controlling resistivity of the film. A method for producing the resistive element and an apparatus therefor are also disclosed.
Bibliography:Application Number: FR19950003368