PROCEDE D'APPLICATION DE REVETEMENTS SUR DES SURFACES REFLECHISSANTES ET INSTALLATION POUR LE REALISER

• Main Author: A. B.MANT, I. E. BELINOVICH, L. S. TUZOV, V. M. KOLOTYRKIN, V. P. FEDORENKO ET J. V. EGOROV
• Format: Patent
• Language: French
• Published: 21.08.1981
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BLASTING; FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMSTHEREOF; HEATING; LIGHTING; MECHANICAL ENGINEERING; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PERFORMING OPERATIONS; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHERARTICLES, NOT OTHERWISE PROVIDED FOR; TRANSPORTING; WEAPONS

LE PROCEDE CONSISTE A APPLIQUER LES REVETEMENTS SUR LES SURFACES REFLECHISSANTES PAR POLYMERISATION DE COMPOSES ORGANIQUES GAZEUX DE DEPART DANS UNE DECHARGE LUMINESCENTE, LA PRESSION DANS LA CHAMBRE ETANT DE 1.10 A 1MM HG, LA DENSITE DE COURANT DANS LA DECHARGE ETANT DE 0,01 A 0,5MACM, ET LA FREQUENCE DU COURANT ALLANT JUSQU'A 40000HZ. L'INSTALLATION COMPREND UNE CHAMBRE A VIDE 5 DANS LAQUELLE SONT PLACES UN EVAPORATEUR 14 DE METAL, DES ELECTRODES POUR LA PRODUCTION DE LA DECHARGE LUMINESCENTE, DES DISPOSITIFS 15 POUR LA FIXATION DES PIECES 1 SUR LESQUELLES DOIT ETRE APPLIQUE LE REVETEMENT. A method of applying coatings on reflecting surfaces by polymerization of the source gaseous organic compounds in a glow discharge at a pressure of 1.10<-2> to 1 mm Hg in the chamber, a discharge current density of 0.01 to 0.5 mA/cm and a current frequency up to 40000 Hz. The source compounds are nitrogen-bearing organosilicon compounds or hydrocarbons of alkane series. The apparatus comprises a vacuum chamber 5 accommodating a metal evaporator 14, electrodes creating a glow discharge, devices 15 for fastening the articles 1 being coated. The electrodes are constituted by the articles 1 installed coaxially relative to one another and insulated from the body of the vacuum chamber 5. Connected by vacuum pipes 10 to the vacuum chamber 5 are evacuating means 6 and devices for metered supply of the vapours of the source compounds into the chamber 5.