Mikroelektromekaanisen laitteen elektrodi

A microelectromechanical device structure comprises a supporting structure wafer. A cavity electrode is formed within a cavity in the supporting structure wafer. The cavity electrode forms a protruding structure from a base of the cavity towards the functional layer, and the cavity electrode is conn...

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Bibliographic Details
Main Author RINKIÖ, Marcus
Format Patent
LanguageFinnish
Swedish
Published 10.03.2017
Subjects
BASIC ELECTRONIC CIRCUITRY
ELECTRICITY
GENERATION OF NOISE BY SUCH CIRCUITS
GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING,BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN ANON-SWITCHING MANNER
GYROSCOPIC INSTRUMENTS
IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS
INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
MEASURING
MEASURING DISTANCES, LEVELS OR BEARINGS
MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK
MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES
MICROSTRUCTURAL TECHNOLOGY
NAVIGATION
PERFORMING OPERATIONS
PHOTOGRAMMETRY OR VIDEOGRAMMETRY
PHYSICS
RESONATORS
SURVEYING
TESTING
TRANSPORTING
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Summary:A microelectromechanical device structure comprises a supporting structure wafer. A cavity electrode is formed within a cavity in the supporting structure wafer. The cavity electrode forms a protruding structure from a base of the cavity towards the functional layer, and the cavity electrode is connected to a defined electrical potential. The cavity electrode comprises a silicon column within the cavity in the supporting structure wafer, which is partially or entirely surrounded by a cavity. One or more cavity electrodes may be utilized for adjusting a frequency of an oscillation occurring within the functional layer.
Bibliography:Application Number: FI20150005648