METODO DE REGULACION DE LA CANTIDAD DE ADHESION MEDIANTE LIMPIEZA CON GAS

• Main Authors: ANDACHI, KAZUNARI, SHIGEMOTO, HARUMI
• Format: Patent
• Language: Spanish
• Published: 16.04.2001
• Edition: 7
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

LAS FORMULAS DE RELACION PARA DETERMINAR UNA CANTIDAD DE ADHESION DE UN MATERIAL DE REVESTIMIENTO SE ESTABLECEN SEPARADAMENTE DE ACUERDO CON UNA RELACION RELATIVA ENTRE UNA ESPACIO DE TOBERA-TIRA D Y UN ESPACIO DE ENDIDURA DE TOBERA B, Y LA CANTIDAD DE ADHESION DEL MATERIAL DE REVESTIMIENTO SE REGULA CON PRECISION SOBRE UNA AMPLIA GAMA DE OPERACIONES QUE USAN LAS FORMULAS DE RELACION. UNA PRESION P DE TOBERA Y UNA VELOCIDAD DE TIRA V ESTAN CONTROLADAS, Y D ES CONTROLADO USANDO LA FORMULA )1) W = H{SUB,1} X {RO}{SUB,M}{SUP,X}{(K1)/(2X{RH}XKXP{SUB,A})}{SUP,1/2}XD{SUP,1/2}X[(MU)XV/{(P/P{SUB,A}) {SUP,K-1)/K-1)]{SUP,1/2}, CUANDO D/B ES INFERIOR O IGUAL A C (REGION DE EXPANSION). CUANDO D/B>C (REGION DE DESARROLLO TOTAL), POR OTRO LADO, AL MENOS D Y B ESTA CONTROLADO USANDO LA FORMULA (2): W = H{SUB,2} X {RO}{SUB,M}{SUP,X}(K1)/2X{RH}XKXP{SUB,A})}{SUP,1/2}XD/B{SUP,1/2}X[(MU)XV/{(P/P{SUB,A}) {SUP,(K-1)/K}-1})]{SUP,1/2}, DE MODO A REGULAR LA CANTIDAD DE ADHESION DE UN METAL FUNDIDO (MATERIAL DE REVESTIMIENTO) ({RH} {SUB,M}: DENSIDAD DE METAL FUNDIDO, (MU): VISCOSIDAD DE METAL FUNDIDO, P{SUB,A}: PRESION DE SALIDA DE TOBERA; {ET}: EFICIENCIA DE TOBERA, K RELACION DE CALOR ESPECIFICO DE GAS, H{SUB,1} Y H{SUB,2}: CONSTANTES. Relational formulas for determining an adhesion quantity of a coating material are separately set in accordance with a relative relation between a nozzle-strip gap D and a nozzle slit gap B, and the adhesion quantity of the coating material is accurately regulated over a broad operation range using the relational formulas. A nozzle pressure P and a strip speed V are controlled, and D is controlled using the formula (1): W = h1 x rho M x ä(K- 1)/(2x eta xKxPA)ü<1/2> x D<1/2> x Ä mu xV/ä(P/PA) <1)/K>-1)Ü<1/2>, when D/B </= C (expansion region). When D/B > C (complete development region), on the other hand, at least one of D and B is controlled using the formula (2): W = h2 x rho M x ä(K-1)/(2x eta xKxPA)ü<1/2> x (D/B<1/2>)xÄ mu x V/ä(P/PA)<(K-1)/K>-1üÜ<1/2>, so as to regulate the adhesion quantity of a molten metal (coating material) ( rho M: density of molten metal, mu : viscosity of molten metal, PA: pressure at nozzle outlet, eta : nozzle efficiency, K: specific heat ratio of gas, h1 and h2: constants).