FLUSHING SYSTEM AND METHOD FOR A LITHOGRAPHIC APPARATUS

There is provided a flushing system for a lithographic apparatus, said flushing system including a gas outlet configured to choke a flow of gas passing through the gas outlet at a predetermined rate. Also provided is a method of flushing a lithographic apparatus, the method including providing a flo...

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Bibliographic Details
Main Authors VAN DEN AKKER, Emericus, Antoon, Theodorus, KALKMAN, Ivo, Michel, LINTHORST, Mart, Willem, HAZARI, Syed, Aaquib, DANNENBERG, Johan, Frederik
Format Patent
LanguageEnglish
French
German
Published 19.06.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:There is provided a flushing system for a lithographic apparatus, said flushing system including a gas outlet configured to choke a flow of gas passing through the gas outlet at a predetermined rate. Also provided is a method of flushing a lithographic apparatus, the method including providing a flow of gas through the lithographic apparatus and operating a gas outlet from the lithographic apparatus such that the flow of gas is choked through the gas outlet.
Bibliography:Application Number: EP20220213693