COPOLYMER AND HOT MELT MATERIALS COMPRISING SAID COPOLYMER

• Main Authors: Roschkowski, Thomas, Taden, Andreas, Schneider, Anja, Arnold, Moritz
• Format: Patent
• Language: English; French; German
• Published: 19.06.2024
• Subjects: ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS AS ADHESIVES; USE OF MATERIALS THEREFOR; WOODSTAINS

The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.1 to 10 wt.% of a) at least one co-polymerizable photoinitiator in accordance with Formula (I):wherein: R1 is NH, CH2, S or O;R2 to R9 are independently selected from H, OH, SH, halide, CN, C1-C6 alkyl, C1-C6 alkoxy, C1-C12 alkoxyalkyl, COOH, SR10, COOR10, N(R10)2 or N(R10)3Q;each R10 is independently selected from C1-C6 alkyl or C6-C18 aryl; and,Q is halide, acetate, phosphate, sulphate or nitrate,subject to the proviso that j of the radicals R2 to R9 are a radical possessing ethylenic unsaturation, wherein j is an integer of from 1 to 3, preferably 1 or 2; and,from 90 to 99.9 wt.% of b) at least one ethylenically unsaturated non-ionic monomer which does not bear an epoxide group or a moiety decomposable under photo-irradiation to form a radical.