METHOD OF FORMING GRAPHENE OXIDE FILM ON A SUBSTRATE

A method of forming a graphene oxide (GO) film on a substrate involves depositing a GO ink on a surface of a porous substrate, and mechanically removing excess ink on the surface of the porous substrate while simultaneously providing a pressure difference that forces a liquid medium of the ink throu...

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Bibliographic Details
Main Authors VERMA, Priyanka, POPE, Michael A, XU, Luzhu, WILSON, Nicholas D
Format Patent
LanguageEnglish
French
German
Published 05.06.2024
Subjects
CHEMISTRY
METALLURGY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Summary:A method of forming a graphene oxide (GO) film on a substrate involves depositing a GO ink on a surface of a porous substrate, and mechanically removing excess ink on the surface of the porous substrate while simultaneously providing a pressure difference that forces a liquid medium of the ink through the porous substrate to provide a GO film on the surface of the porous substrate. The method provides GO membranes having similar water vapor permeance but significantly better selectivity to GO membranes produced by traditional blade casting methods and to GO membranes produced by traditional vacuum filtration methods.
Bibliography:Application Number: EP20220847749