CHARGED PARTICLE ASSESSMENT METHOD AND SYSTEM

A charged particle assessment method for identifying candidate defects in samples by scanning a charged particle beam across a sample; the method comprising:obtaining a first reference image from a first region of the sample and a second reference image from a second region of the sample using a cha...

Full description

Saved in:
Bibliographic Details
Main Authors DAVE, Dhara, KUIPER, Vincent, Sylvester
Format Patent
LanguageEnglish
French
German
Published 29.05.2024
Subjects
BASIC ELECTRIC ELEMENTS
CALCULATING
COMPUTING
COUNTING
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:A charged particle assessment method for identifying candidate defects in samples by scanning a charged particle beam across a sample; the method comprising:obtaining a first reference image from a first region of the sample and a second reference image from a second region of the sample using a charged particle assessment apparatus;obtaining a sample image from a third region of the sample using the charged particle assessment apparatus; andcomparing the sample image to the first reference image and to the second reference image to identify any candidate defects in the third region;wherein the first reference image and/or the second reference image are obtained with a higher fidelity than the sample image.
Bibliography:Application Number: EP20220209971