APPARATUS AND METHODS FOR FILTERING MEASUREMENT RADIATION

• Main Authors: BRULS, Dominique, Maria, ZHOU, Zili, ARABUL, Mustafa, Ümit
• Format: Patent
• Language: English; French; German
• Published: 24.04.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A source selection module comprising an adjustable diffraction element comprising multiple pixels. The source selection module further comprises a light dispersive element configured for receiving a first and a second light. The light dispersive element distributes the first light over a first pixel to generate a zeroth and a non-zeroth diffraction order. The light dispersive element further spatially distributes the second light over a second pixel to generate a zeroth and a non-zeroth diffraction order. The source selection module comprises a continuous variable filter comprising a first and a second area. The zeroth order of the first light received by the first area and the zeroth order of the second light received by the second area are transmitted or reflected. The non-zeroth order of the first light is blocked outside of the first area, and the non-zeroth order of the second light is blocked outside of the second area.