PATTERNED MATERIALS AND FILMS AND SYSTEMS AND METHODS FOR MAKING THE SAME

The present invention discloses a thermal management and/or electromagnetic interference (EMI) mitigation material comprising a multilayer film structure defined by a plurality of layers having different filler densities per layer such that the multilayer film structure has differential filler loadi...

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Bibliographic Details
Main Authors SONG, John, STRADER, Jason L, DIXON, Paul Francis, ENGLISH, Gerald R, MCBAIN, Douglas S
Format Patent
LanguageEnglish
French
German
Published 10.04.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PRINTED CIRCUITS
SEMICONDUCTOR DEVICES
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Summary:The present invention discloses a thermal management and/or electromagnetic interference (EMI) mitigation material comprising a multilayer film structure defined by a plurality of layers having different filler densities per layer such that the multilayer film structure has differential filler loading within the layers and/or a filler density gradient that increases or decreases from a top layer to a bottom layer.
Bibliography:Application Number: EP20240158538