OPTICAL DEVICE, METHOD FOR ADJUSTING A SETPOINT DEFORMATION AND LITHOGRAPHY SYSTEM

An optical apparatus for a lithography system comprises at least one optical element comprising an optical surface. The optical apparatus also comprises one or more actuators for deforming the optical surface. A strain gauge device is provided for determining the deformation of the optical surface....

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Bibliographic Details
Main Authors MANGER, Matthias, POLLAK, Thilo, GWOSCH, Klaus, TROEGER, Stefan, KOENIGER, Andreas, RAAB, Markus, BLEIDISTEL, Sascha, VOGLER, Alexander
Format Patent
LanguageEnglish
French
German
Published 10.04.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An optical apparatus for a lithography system comprises at least one optical element comprising an optical surface. The optical apparatus also comprises one or more actuators for deforming the optical surface. A strain gauge device is provided for determining the deformation of the optical surface. The strain gauge device comprises at least one optical fiber that maintains polarization.
Bibliography:Application Number: EP20220732017