OPTICAL DEVICE, METHOD FOR ADJUSTING A SETPOINT DEFORMATION AND LITHOGRAPHY SYSTEM
An optical apparatus for a lithography system comprises at least one optical element comprising an optical surface. The optical apparatus also comprises one or more actuators for deforming the optical surface. A strain gauge device is provided for determining the deformation of the optical surface....
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Main Authors | , , , , , , , |
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Format | Patent |
Language | English French German |
Published |
10.04.2024
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Subjects | |
Online Access | Get full text |
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Summary: | An optical apparatus for a lithography system comprises at least one optical element comprising an optical surface. The optical apparatus also comprises one or more actuators for deforming the optical surface. A strain gauge device is provided for determining the deformation of the optical surface. The strain gauge device comprises at least one optical fiber that maintains polarization. |
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Bibliography: | Application Number: EP20220732017 |