PELLICLE ATTACHMENT APPARATUS

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the...

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Main Authors JANSSEN, Maurice, Leonardus, Johannes, BROUNS, Derk, Servatius, Gertruda, LOOPSTRA, Erik, Roelof, DE KLERK, Angelo, Cesar, Peter, LEENDERS, Martinus, Hendrikus, Antonius, JANSEN, Maarten, Mathijs, Marinus, VAN LOO, Jérôme, François, Sylvain, Virgile, VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien, LOOS, Michel, KERSTENS, Roland, Jacobus, Johannes, DEKKERS, Jeroen, VAN DER MEULEN, Frits, BRUIJN, Marc, DINGS, Jacobus, Maria, AZEREDO LIMA, Jorge, Manuel, KRUIZINGA, Matthias, THEUERZEIT, Frank, Johannes, Christiaan, LANSBERGEN, Robert, Gabriël, Maria, KESTER, Martinus, Jozef, Maria, JANSSEN, Paul, VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus, REIJNDERS, Silvester, Matheus, KRAMER, Ronald, Harm, Gunther, VAN DEN BOSCH, Gerrit, MIDDEL, Geert
Format Patent
LanguageEnglish
French
German
Published 06.03.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Bibliography:Application Number: EP20230203497