METHOD AND DEVICE FOR PRODUCING A SEMICONDUCTOR COMPONENT
A device and method for producing a semiconductor component. The method includes: arranging a dielectric layer between a first electrode and a second electrode of the semiconductor component, there being defects of a first defect type in the dielectric layer; determining a time period for movement o...
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Main Authors | , , , |
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Format | Patent |
Language | English French German |
Published |
08.11.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A device and method for producing a semiconductor component. The method includes: arranging a dielectric layer between a first electrode and a second electrode of the semiconductor component, there being defects of a first defect type in the dielectric layer; determining a time period for movement of defects of the first defect type into a target position in the dielectric layer; determining a first voltage for the movement of said defects in the dielectric layer; applying the first voltage between the first electrode and the second electrode in the time period. |
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Bibliography: | Application Number: EP20210836480 |