METHOD AND DEVICE FOR PRODUCING A SEMICONDUCTOR COMPONENT

A device and method for producing a semiconductor component. The method includes: arranging a dielectric layer between a first electrode and a second electrode of the semiconductor component, there being defects of a first defect type in the dielectric layer; determining a time period for movement o...

Full description

Saved in:
Bibliographic Details
Main Authors SCHATZ, Frank, MEWS, Mathias, SCHARY, Timo, MONTEIRO DINIZ REIS, Daniel
Format Patent
LanguageEnglish
French
German
Published 08.11.2023
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A device and method for producing a semiconductor component. The method includes: arranging a dielectric layer between a first electrode and a second electrode of the semiconductor component, there being defects of a first defect type in the dielectric layer; determining a time period for movement of defects of the first defect type into a target position in the dielectric layer; determining a first voltage for the movement of said defects in the dielectric layer; applying the first voltage between the first electrode and the second electrode in the time period.
Bibliography:Application Number: EP20210836480