A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus so that a radiation beam projected from the...
Saved in:
Main Authors | , , , , |
---|---|
Format | Patent |
Language | English French German |
Published |
01.11.2023
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus so that a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including a replaceable plate with an outer surface that includes a plurality of fluid openings configured for supply and/or extraction of immersion liquid and/or gas in a channel between the fluid handling system and the substrate, wherein the outer surface is coated. |
---|---|
Bibliography: | Application Number: EP20210820513 |