MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL

The invention relates to a material including a substrate (30) coated on one face (29) with a stack of thin films (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric under...

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Bibliographic Details
Main Authors GUIMARD, Denis, ORVEN, Matthieu, BARRES, Thomas
Format Patent
LanguageEnglish
French
German
Published 25.10.2023
Subjects
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMISTRY
GLASS
JOINING GLASS TO GLASS OR OTHER MATERIALS
METALLURGY
MINERAL OR SLAG WOOL
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
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Summary:The invention relates to a material including a substrate (30) coated on one face (29) with a stack of thin films (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric underlayer based on zinc and tin, SniZnjO (128), between 3.0 and 50.0 nm; - a nitride dielectric underlayer based on silicon-zirconium, SixNyZrZ (127), under and in contact with said zinc-based oxide underlayer, ZnO (129), between 5.0 and 50.0 nm; and - a nitride dielectric underlayer based on silicon, Si3N4 (127) or silicon-zirconium, SixNyZrZ, between 5.0 and 50.0 nm.
Bibliography:Application Number: EP20210851972