GLASS SUBSTRATE HEAT CHAMFERING METHOD AND APPARATUS

Provided is a glass substrate heat chamfering method. An edge of a glass substrate (100) is chamfered by applying thermal shock to the edge of the glass substrate (100), thereby peeling a strip (100a) off from the edge of the glass substrate (100). The strip is cut at a predetermined point thereon b...

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Bibliographic Details
Main Authors RYOO, Seong-ryong, CHOWDHURY, Dipakbin Qasem, KIM, Euisoo, KIM, EuiHo
Format Patent
LanguageEnglish
French
German
Published 25.10.2023
Subjects
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Summary:Provided is a glass substrate heat chamfering method. An edge of a glass substrate (100) is chamfered by applying thermal shock to the edge of the glass substrate (100), thereby peeling a strip (100a) off from the edge of the glass substrate (100). The strip is cut at a predetermined point thereon before being broken due to the weight thereof. The strip (100a) is cut by applying at least one of heat and a laser beam to the predetermined point or by applying a flame (300a) of a torch (300) to the predetermined point. The application of the thermal shock includes brining a heating element (210) into contact with the edge of the glass substrate (100). In the chamfering, the heating element (210) is relatively moved along the edge of the glass substrate (100) while being brought into contact with the edge of the glass substrate (100).
Bibliography:Application Number: EP20210907863