METHOD FOR OBTAINING BIMODAL MESOPOROUS MATERIALS BASED ON SILICON OXIDES USING MICROWAVE RADIATION

A method for obtaining bimodal mesoporous materials based on silicon oxides by using microwave radiation. A method for obtaining bimodal mesoporous materials, based on silicon oxides, from atranic precursors, characterized in that it comprises: - a first step of forming a mesostructured material con...

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Main Authors AMORÓS DEL TORO, Pedro, ROS LIS, José Vicente, MUÑOZ PINA, Sara, EL HASKOURI BENNAGI, Jamal, DÍAZ DE GREÑU PUERTAS, Borja, COSTERO NIETO, Ana María, DE LOS REYES CÁNOVAS, Ruth
Format Patent
LanguageEnglish
French
German
Published 04.10.2023
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Summary:A method for obtaining bimodal mesoporous materials based on silicon oxides by using microwave radiation. A method for obtaining bimodal mesoporous materials, based on silicon oxides, from atranic precursors, characterized in that it comprises: - a first step of forming a mesostructured material containing organic matter, - and a second step of eliminating the organic matter contained in the mesostructured material, by calcination, obtaining a bimodal mesoporous material based on silicon oxide, such that at least one of the two steps is carried out by irradiation of the corresponding starting material, with microwave radiation from solid state sources.
Bibliography:Application Number: EP20210897249