ARRANGEMENT FOR ROTATABLE POSITIONING OF A SUBSTRATE

• Main Authors: WALTER, Lars, HEISS, Martin
• Format: Patent
• Language: English; French; German
• Published: 13.09.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

An arrangement (1) is described for manipulating a flat substrate (3) in a vacuum chamber. The arrangement (1) comprises an arm (6) having a length axis (9) extending between a first end (7) and a second end (8). The arm (6) comprises at the second end (8) a cooling surface (10) for cooling of the flat substrate (3) in contact with the cooling surface (10), wherein the cooling surface (10) has a centre axis (11) extending essentially perpendicular to the cooling surface (10) axis (9). The clamping device (17) comprises a first bearing device (21) arranged around the centre axis (11) and movable in the direction along the centre axis (11), a substrate clamping device (22) comprising a second bearing device (23) in engagement with the first bearing device (21) such that the second bearing device (23) is rotatable around the centre axis (11), and a substrate engagement device (24), fixed to the second bearing device (23), and configured for engagement with the periphery (47) of the substrate (3). The clamping device (17) also comprises an adjustable actuation device (25), which is configured to apply an adjustable actuation force on the first bearing device (21) in the direction along the centre axis (11), such that the substrate (3) is pressed towards the cooling surface (10).