ELECTROSTATIC CHUCK WITH EMBOSSMENTS THAT COMPRISE DIAMOND-LIKE CARBON AND DEPOSITED SILICON-BASED MATERIAL, AND RELATED METHODS

Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including embossments that are made of multiple deposited layers, the layers including diamond-like carbon layers and layers that contain silicon-based materia...

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Bibliographic Details
Main Authors LIU, Yan, CHAN, Chun Wang, DONNELL, Steven, RYBCZYNSKI, Jakub, MINSKY, Caleb
Format Patent
LanguageEnglish
French
German
Published 09.10.2024
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including embossments that are made of multiple deposited layers, the layers including diamond-like carbon layers and layers that contain silicon-based materials such as silicon carbide layers.
Bibliography:Application Number: EP20210864937