ANTI-REFLECTION SUBSTRATE

According to the present invention, there can be provided an antireflection substrate formed by laminating the following layers (A), (B), (C) and (D) in this order:a substrate layer (A),a hard coating layer (B),a light absorbing layer (C), anda low refractive index layer (D), formed by curing a low...

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Bibliographic Details
Main Authors YAMAMOTO Yoshiaki, WAKAYAMA Shota
Format Patent
LanguageEnglish
French
German
Published 26.04.2023
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:According to the present invention, there can be provided an antireflection substrate formed by laminating the following layers (A), (B), (C) and (D) in this order:a substrate layer (A),a hard coating layer (B),a light absorbing layer (C), anda low refractive index layer (D), formed by curing a low refractive index resin composition containing an active energy ray-curable resin, hollow silica and a fluorine compound by an active energy ray, whereinthe film thickness of the light absorbing layer (C) is 1 to 20 nm.
Bibliography:Application Number: EP20210825445