ATOMIC LAYER DEPOSITION HEAD UNIT AND METHOD

• Main Authors: HEMERIK, Marcel Maurice, VAN DE VELDEN, Marinus Adrianus Elizabeth, KREMERS, Erik Antonius Franciscus
• Format: Patent
• Language: English; French; German
• Published: 12.04.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method and head unit for atomic layer deposition, ALD. The head unit has an output face including a first elongate feed slit for outputting a first process gas therethrough towards a substrate and a second elongate feed slit for outputting a second process gas therethrough towards a substrate. The head unit further has at least a first and a second elongate purge slit in the output face between the first elongate feed slit and the second elongate feed sit for outputting a purge gas therethrough towards the substrate.