NANOPORE CELL WITH SEAMLESS WORKING ELECTRODE AND METHODS OF FORMING THE SAME

A nanopore cell may include a well having a seamless porous electrode and hydrophobic sidewalls. The seamless porous electrode may be formed by depositing porous electrode material on a planar electrode support layer formed by a conductive layer island and a dielectric layer. The porous electrode ma...

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Bibliographic Details
Main Authors FOSTER, John C, NG, Marowen, HONER, Kenneth A
Format Patent
LanguageEnglish
French
German
Published 05.04.2023
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Summary:A nanopore cell may include a well having a seamless porous electrode and hydrophobic sidewalls. The seamless porous electrode may be formed by depositing porous electrode material on a planar electrode support layer formed by a conductive layer island and a dielectric layer. The porous electrode material may form uniform seamless columns and may be protected during manufacturing by depositing a selectably removable protective layer thereon. The well may be formed by forming and then patterning hydrophobic cladding over the protective layer. The protective layer may be removed to expose the seamless porous electrode at the bottom of the well.
Bibliography:Application Number: EP20210729832