CERTAIN IMPROVEMENTS OF MULTI-BEAM GENERATING AND MULTI-BEAM DEFLECTING UNITS

Certain improvements of multi-beam raster units such as multi-beam generating units and multi-beam deflector units of a multi-beam charged particle microscopes are provided. The improvements include design, fabrication and adjustment of multi-beam raster units including apertures of specific shape a...

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Bibliographic Details
Main Authors RIEDESEL, Christof, KURIJ, Georg, FRITZ, Hans, ZEIDLER, Dirk, LENKE, Ralf, MAJOR, András, G, SAROV, Yanko, BIHR, Ulrich
Format Patent
LanguageEnglish
French
German
Published 18.01.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:Certain improvements of multi-beam raster units such as multi-beam generating units and multi-beam deflector units of a multi-beam charged particle microscopes are provided. The improvements include design, fabrication and adjustment of multi-beam raster units including apertures of specific shape and dimensions. The improvements can enable multi-beam generation and multi-beam deflection or stigmation with higher precision. The improvements can be relevant for routine applications of multi-beam charged particle microscopes, for example in semiconductor inspection and review, where high reliability and high reproducibility and low machine-to-machine deviations are desirable.
Bibliography:Application Number: EP20210712715