SULFATE FREE CLEAR PERSONAL CLEANSING COMPOSITION COMPRISING LOW INORGANIC SALT

A clear personal cleansing composition having an anionic surfactant, a cationic deposition polymer, an aqueous carrier and a level of inorganic salt of from about 0 to about 1 wt%. The composition is substantially free of sulfates and has a %T of greater than about 80%. The composition can further c...

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Bibliographic Details
Main Authors BUREIKO, Andrei Sergeevich, HUTTON III, Howard David, KOENIG, Peter Herbert, SONG, Brian Xiaoqing, COCHRAN, Brooke Michele
Format Patent
LanguageEnglish
French
German
Published 28.12.2022
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Summary:A clear personal cleansing composition having an anionic surfactant, a cationic deposition polymer, an aqueous carrier and a level of inorganic salt of from about 0 to about 1 wt%. The composition is substantially free of sulfates and has a %T of greater than about 80%. The composition can further comprise amphoteric surfactants. The composition remains phase stable and minimizes coacervate formulation until after dilution with water.
Bibliography:Application Number: EP20220189741