DEEP BRAIN STIMULATION LEAD

The present disclosure discusses a system and methods for a deep brain stimulation lead. More particularly, the disclosure discusses a stimulation lead that includes one or more silicon based barrier layers within a MEMS film. The silicon based barrier layers can improve device reliability and durab...

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Bibliographic Details
Main Authors BOERS, Marc, DRANSART, Alain, MERCANZINI, Andre, JORDAN, Alain, MICHALIS, Alexandre
Format Patent
LanguageEnglish
French
German
Published 30.11.2022
Subjects
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROTHERAPY
HUMAN NECESSITIES
HYGIENE
MAGNETOTHERAPY
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
MEDICAL OR VETERINARY SCIENCE
PRINTED CIRCUITS
RADIATION THERAPY
ULTRASOUND THERAPY
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Summary:The present disclosure discusses a system and methods for a deep brain stimulation lead. More particularly, the disclosure discusses a stimulation lead that includes one or more silicon based barrier layers within a MEMS film. The silicon based barrier layers can improve device reliability and durability. The silicon based barrier layers can also improve adhesion between the layers of the MEMS film.
Bibliography:Application Number: EP20220176763