METHOD FOR MANUFACTURING INFRARED CUT-OFF FILTER, FILTER FOR SOLID-STATE IMAGING ELEMENT, AND SOLID-STATE IMAGING ELEMENT

A method for producing an infrared light cut filter includes: forming an infrared light cut layer containing an infrared light absorbing dye; forming a protective layer on the infrared light cut layer for providing protection against a stripping solution; forming a resist pattern on the protective l...

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Bibliographic Details
Main Authors AKENO Yasutake, IWATA Reiko, HIRAI Yuri
Format Patent
LanguageEnglish
French
German
Published 02.11.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A method for producing an infrared light cut filter includes: forming an infrared light cut layer containing an infrared light absorbing dye; forming a protective layer on the infrared light cut layer for providing protection against a stripping solution; forming a resist pattern on the protective layer; patterning the protective layer and the infrared light cut layer by dry etching using the resist pattern; and removing the resist pattern from the protective layer using the stripping solution.
Bibliography:Application Number: EP20200906993