NANOSCALE TOPOGRAPHY SYSTEM FOR USE IN DNA SEQUENCING AND METHOD FOR FABRICATION THEREOF
A method of fabricating a nanoscale topography system for inducing unfolding of a DNA molecule for sequencing includes providing a substrate and creating trench walls on the substrate which define a trench therebetween. The method further includes depositing a layer of a block copolymer (BCP) in the...
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Main Authors | , , , , , |
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Format | Patent |
Language | English French German |
Published |
26.10.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A method of fabricating a nanoscale topography system for inducing unfolding of a DNA molecule for sequencing includes providing a substrate and creating trench walls on the substrate which define a trench therebetween. The method further includes depositing a layer of a block copolymer (BCP) in the trench and forming cylindrical domains by self-assembly of the BCP between the trench walls, removing a first portion of the cylindrical domains to create a vacant region in the trench, and depositing a subsequent layer of the BCP in the vacant region and forming spherical domains by self-assembly of the BCP between the trench walls adjacent a second portion of the cylindrical domains. The spherical domains form staggered post structures for unfolding the DNA molecule and the cylindrical domains form parallel channel structures for entry of the DNA molecule for sequencing. |
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Bibliography: | Application Number: EP20200820831 |