METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METROLOGY APPARATUS

Disclosed is a method of optimizing a target layout for a patterning device and a sampling scheme for measuring the targets of said target layout exposed on a substrate, the method comprising co-optimizing said target layout and said sampling scheme to obtain an optimized target layout for the patte...

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Bibliographic Details
Main Authors WERKMAN, Roy, RIJPSTRA, Manouk, WILDENBERG, Jochem, Sebastiaan
Format Patent
LanguageEnglish
French
German
Published 12.10.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Disclosed is a method of optimizing a target layout for a patterning device and a sampling scheme for measuring the targets of said target layout exposed on a substrate, the method comprising co-optimizing said target layout and said sampling scheme to obtain an optimized target layout for the patterning device and an optimized sampling scheme for measuring the targets of the optimized target layout exposed on a substrate..
Bibliography:Application Number: EP20210167239