LITHOGRAPHY APPARATUS COMPONENT AND METHOD

There is provided a reticle stage for a lithography apparatus, said reticle stage comprising: at least one optical element having an area to be cleaned; a radiation beam target; and a control system configured to direct a radiation beam to the radiation beam target wherein the interaction of the rad...

Full description

Saved in:
Bibliographic Details
Main Authors BLAUW, Michiel Alexander, DER KINDEREN, Ronny
Format Patent
LanguageEnglish
French
German
Published 22.06.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:There is provided a reticle stage for a lithography apparatus, said reticle stage comprising: at least one optical element having an area to be cleaned; a radiation beam target; and a control system configured to direct a radiation beam to the radiation beam target wherein the interaction of the radiation beam and a gas creates an optical element-cleaning plasma, wherein the radiation beam target is located to provide the optical element-cleaning plasma to the at least one optical element to clean the optical element, and wherein the at least one optical element is a different element than the radiation beam target, preferably wherein the heat sensitive element is a fiducial. Also described are a fiducial for a lithographic apparatus comprising at least one curved edge, a lithographic apparatus comprising the reticle stage or fiducial, and a method of cleaning an optical element of a reticle stage.
Bibliography:Application Number: EP20200214417