METHOD FOR MANUFACTURING AN ELECTROSTATIC DISCHARGE PROTECTION CIRCUIT AND ELECTROSTATIC DISCHARGE PROTECTION CIRCUIT
In a method for manufacturing an electrostatic discharge protection circuit, an electrostatic discharge device structure (12A) is formed during a front side processing of a semiconductor substrate in a first area. Contact pads (17, 18) are formed on the front side on the electrostatic discharge devi...
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
25.05.2022
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Subjects | |
Online Access | Get full text |
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Summary: | In a method for manufacturing an electrostatic discharge protection circuit, an electrostatic discharge device structure (12A) is formed during a front side processing of a semiconductor substrate in a first area. Contact pads (17, 18) are formed on the front side on the electrostatic discharge device structure and in a second area. During back side processing of the semiconductor substrate, a metal connection (14A) between the first electrostatic discharge device structure (12A) and the second area is formed. |
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Bibliography: | Application Number: EP20200209267 |