STOP, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture.

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Bibliographic Details
Main Authors GRUNER, Toralf, MODESTE, Benjahman Julius, GOLDE, Daniel, ZWEERING, Ralf, LOERING, Ulrich, XALTER, Stefan
Format Patent
LanguageEnglish
French
German
Published 11.05.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture.
AbstractList A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture.
Author XALTER, Stefan
LOERING, Ulrich
MODESTE, Benjahman Julius
GRUNER, Toralf
GOLDE, Daniel
ZWEERING, Ralf
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– fullname: LOERING, Ulrich
– fullname: XALTER, Stefan
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DocumentTitleAlternate ANSCHLAG, OPTISCHES SYSTEM UND LITHOGRAFIEGERÄT
BUTÉE, SYSTÈME OPTIQUE ET APPAREIL DE LITHOGRAPHIE
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Snippet A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop...
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title STOP, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
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