STOP, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture.
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Main Authors | , , , , , |
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Format | Patent |
Language | English French German |
Published |
11.05.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture. |
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Bibliography: | Application Number: EP20200736291 |