A MIRROR CALIBRATING METHOD, A POSITION MEASURING METHOD, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

The invention provides a method for calibrating a mirror of an interferometer system configured to measure a position of an object using two interferometers of the interferometer system that are arranged at opposite sides of the object and configured to measure the position of the object in the same...

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Bibliographic Details
Main Authors ADRIAENS, Johannes, Mathias, Theodorus, Antonius, SCHOORMANS, Carolus, Johannes, Catharina, SEELEN, Luuk, Johannes, Helena
Format Patent
LanguageEnglish
French
German
Published 11.05.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TESTING
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Summary:The invention provides a method for calibrating a mirror of an interferometer system configured to measure a position of an object using two interferometers of the interferometer system that are arranged at opposite sides of the object and configured to measure the position of the object in the same X-direction, wherein two sets of measurements are obtained for different rotational orientations about an axis perpendicular to the X-direction to determine a shape of the mirror. The invention further provides a position measuring method in which the obtained shape of the mirror is used to adjust the measurements in X-direction, a lithographic apparatus and a device manufacturing method making use of such a lithographic apparatus.
Bibliography:Application Number: EP20200730048