METHOD FOR MANUFACTURING SENSOR DEVICE AND SENSOR DEVICE
A sensor device includes a substrate having a substrate surface, a first IDT electrode positioned on the substrate surface, a second IDT electrode positioned on the substrate surface, a waveguide, and a protective film. The waveguide is positioned on the substrate surface and between the first IDT e...
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
02.03.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A sensor device includes a substrate having a substrate surface, a first IDT electrode positioned on the substrate surface, a second IDT electrode positioned on the substrate surface, a waveguide, and a protective film. The waveguide is positioned on the substrate surface and between the first IDT electrode and the second IDT electrode. The waveguide includes a first immobilized layer positioned on the substrate surface and a second immobilized layer positioned on the first immobilized layer. The second immobilized layer is positioned inside an outer edge of the first immobilized layer as seen in a plan view. |
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Bibliography: | Application Number: EP20200795475 |