GALLIUM NITRIDE DEVICE AND DRIVE CIRCUIT THEREOF
This application provides a gallium nitride component and a drive circuit thereof. The gallium nitride component includes: a substrate; a gallium nitride GaN buffer layer formed on the substrate; an aluminum gallium nitride AlGaN barrier layer formed on the GaN buffer layer; and a source, a drain, a...
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
22.12.2021
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Subjects | |
Online Access | Get full text |
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Summary: | This application provides a gallium nitride component and a drive circuit thereof. The gallium nitride component includes: a substrate; a gallium nitride GaN buffer layer formed on the substrate; an aluminum gallium nitride AlGaN barrier layer formed on the GaN buffer layer; and a source, a drain, and a gate formed on the AlGaN barrier layer. The gate includes a P-doped gallium nitride P-GaN cap layer formed on the AlGaN barrier layer, and a first gate metal and a second gate metal formed on the P-GaN cap layer. A Schottky contact is formed between the first gate metal and the P-GaN cap layer, and an ohmic contact is formed between the second gate metal and the P-GaN cap layer. In the technical solution provided in this application, the gallium nitride component is a normally-off component, and is conducive to design of a drive circuit. In addition, the gallium nitride component has a hybrid gate structure that includes a Schottky gate and an ohmic gate, so that not only gate leakage currents in a conduction process can be reduced to reduce driving power consumption, but also a large quantity of electron holes can be injected into the AlGaN barrier layer during conduction to optimize a dynamic resistance, thereby improving component reliability. |
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Bibliography: | Application Number: EP20200919393 |