SYSTEM FOR CONTROLLED DEPOSITING OF A FLUID ON A SUBSTRATE

The present invention relates to a system for controlled deposition of a fluid on a substrate and also to a method employing the system. The system comprises:a nanoinjector,a mechanical resonator fixed to the nanoinjector, the mechanical resonator being adapted to detect contact between the nanoinje...

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Bibliographic Details
Main Authors JUBIN, Laetitia, SIRIA, Alessandro, NIGUES, Antoine, BOCQUET, Lydéric
Format Patent
LanguageEnglish
French
German
Published 18.10.2023
Subjects
AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
PERFORMING OPERATIONS
SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR
SHAPING OR JOINING OF PLASTICS
TRANSPORTING
WORKING OF PLASTICS
WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Summary:The present invention relates to a system for controlled deposition of a fluid on a substrate and also to a method employing the system. The system comprises:a nanoinjector,a mechanical resonator fixed to the nanoinjector, the mechanical resonator being adapted to detect contact between the nanoinjector and the substrate,control means of the mechanical resonator comprising:an excitation means adapted to cause the mechanical resonator to oscillate at an oscillation frequency (fi),a detector means adapted to detect the oscillation of the mechanical resonator,a regulator means adapted to adjust the contact between the nanoinjector and the substrate by controlling the oscillation of the mechanical resonator.
Bibliography:Application Number: EP20190845772