A METHOD IN THE MANUFACTURING PROCESS OF A DEVICE, A NON-TRANSITORY COMPUTER-READABLE MEDIUM AND A SYSTEM CONFIGURED TO PERFORM THE METHOD

Disclosed herein is a method for determining an image-metric of features on a substrate, the method comprising: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of t...

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Bibliographic Details
Main Authors KIERS, Antoine, Gaston, Marie, TIMOSHKOV, Vadim Yourievich, TEL, Wim, Tjibbo, ZHANG, Yichen, WANG, Te-Sheng, DILLEN, Hermanus, Adrianus, CHEN, Tzu-Chao
Format Patent
LanguageEnglish
French
German
Published 15.09.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Disclosed herein is a method for determining an image-metric of features on a substrate, the method comprising: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of the one or more further images is of a different layer of the substrate than the first image; generating aligned versions of the first and one or more further images by performing an alignment process on the first and one or more further images; and calculating an image-metric in dependence on a comparison of the features in the aligned version of the first image and the corresponding features in the aligned versions of the one or more further images.
Bibliography:Application Number: EP20190770103