ION SOURCE ASSEMBLY WITH IMPROVED ELECTRON EMISSION CURRENT MEASUREMENT FOR SUPERIOR INSTRUMENT-TO-INSTRUMENT REPEATABILITY

An ion source assembly is described that includes an electron source configured to inject electrons into an ion volume to ionize an atom or molecule in the ion volume, wherein the electron source includes a filament. A lens electrode is positioned adjacent the electron source and includes an opening...

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Bibliographic Details
Main Authors BALDWIN, Lawrence G, SMITH, Johnathan Wayne, McCAULEY, Edward B
Format Patent
LanguageEnglish
French
German
Published 08.03.2023
Subjects
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Summary:An ion source assembly is described that includes an electron source configured to inject electrons into an ion volume to ionize an atom or molecule in the ion volume, wherein the electron source includes a filament. A lens electrode is positioned adjacent the electron source and includes an opening configured to pass electrons therethrough from the electron source into the ion volume. A supply voltage source is coupled to the filament and configured to supply a first voltage to the filament, wherein the first voltage is operable to ionize the molecules in the ion volume. Further, a bias voltage source is coupled to the supply voltage source and configured to supply a bias voltage to the lens electrode. Electrons striking the lens electrode are thereafter returned to the filament.
Bibliography:Application Number: EP20200214479