RAPID THERMAL CYCLING DEVICES

A rapid thermal cycling device can include a static microfluidic reaction chamber that can be defined between a layered substrate and a cover that can have an average space therebetween from 4 μm to 150 μm. The layered substrate can include a heating element thermally coupled to the static microflui...

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Bibliographic Details
Main Authors GOVYADINOV, Alexander, KORNILOVICH, Pavel
Format Patent
LanguageEnglish
French
German
Published 26.05.2021
Subjects
CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
PHYSICS
TESTING
TRANSPORTING
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Summary:A rapid thermal cycling device can include a static microfluidic reaction chamber that can be defined between a layered substrate and a cover that can have an average space therebetween from 4 μm to 150 μm. The layered substrate can include a heating element thermally coupled to the static microfluidic reaction chamber to heat a fluid when present therein. The layered substrate, the cover, or both can include a heat diffusing material thermally coupled to the static microfluidic reaction chamber to diffuse heat out from the fluid while remaining in the static microfluidic reaction chamber.
Bibliography:Application Number: EP20190894808