PLASMA EXPOSURE DEVICE

A plasma emitting device includes plasma head 14 configured to generate a plasmarized gas and jet the plasmarized gas so generated from a nozzle thereof, a gas supply device 50 configured to supply a gas to the plasma head while controlling a flow rate of the gas, gas tube 60 connecting the gas supp...

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Bibliographic Details
Main Authors JINDO, Takahiro, IKEDO, Toshiyuki, NIWA, Akihiro, TAKIKAWA, Shinji
Format Patent
LanguageEnglish
French
German
Published 28.10.2020
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Summary:A plasma emitting device includes plasma head 14 configured to generate a plasmarized gas and jet the plasmarized gas so generated from a nozzle thereof, a gas supply device 50 configured to supply a gas to the plasma head while controlling a flow rate of the gas, gas tube 60 connecting the gas supply device with the plasma head to constitute a gas flow path, and pressure detector 62 configured to detect a pressure of the gas supplied from the gas supply deice. Pressures PA to PD of gases which are supplied to the plasma head are detected for use for various purposes, whereby the practical plasma emitting device is made up. Specifically, for example, a head clogging, which is a clog impeding a gas flow in the plasma head, can be determined without difficulty based on the detected pressure.
Bibliography:Application Number: EP20170935609