INTEGRATED SENSOR OF IONIZING RADIATION AND IONIZING PARTICLES

This disclosure provides a semiconductor sensor of ionizing radiation and/or ionizing particles with a backside bias electrode and a backside junction for completely depleting the semiconductor substrate up to carrier collection regions each connected to a respective collection electrode of carriers...

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Bibliographic Details
Main Authors DI COLA, Onorato, DA ROCHA ROLO, Manuel Dionisio, PANCHERI, Lucio, GIUBILATO, Piero, MARGUTTI, Giovanni, RIVETTI, Angelo
Format Patent
LanguageEnglish
French
German
Published 24.11.2021
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Summary:This disclosure provides a semiconductor sensor of ionizing radiation and/or ionizing particles with a backside bias electrode and a backside junction for completely depleting the semiconductor substrate up to carrier collection regions each connected to a respective collection electrode of carriers generated by ionization in the substrate. Differently from prior sensors, the sensor of this disclosure has an intermediate semiconductor layer formed upon the substrate, having a greater doping concentration than the doping concentration of the substrate and a doping of a same type. In this intermediate layer, buried doped regions of opposite type one separated from the other are formed for shielding superficial regions in which readout circuits are defined.
Bibliography:Application Number: EP20180797153